Global Standards for the Microelectronics Industry
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| Title | Document # | Date |
|---|---|---|
PROCEDURE FOR WAFER-LEVEL-TESTING OF THIN DIELECTRICS:Status: Rescinded |
JESD35A | Apr 2001 |
JESD35A was rescinded by the committee in June 2024 and has been superseded by JESD263. The revised JESD35 is intended for use in the MOS Integrated Circuit manufacturing industry. It describes procedures developed for estimating the overall integrity and reliability of thin gate oxides. Three basic test procedures are described, the Voltage-Ramp (V-Ramp), the Current-Ramp (J-Ramp) and the new Constant Current (Bounded J-Ramp) test. Each test is designed for simplicity, speed and ease of use. The standard has been updated to include breakdown criteria that are more robust in detecting breakdown in thinner gate oxides that may not experience hard thermal breakdown. Committee(s): JC-14.2 |
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