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Displaying 1 - 3 of 3 documents.

Title	Document #	Date
FOUNDRY PROCESS QUALIFICATION GUIDELINES - BACKEND OF LIFE (Wafer Fabrication Manufacturing Sites)	JEP001-1A	Sep 2018
This document describes backend-level test and data methods for the qualification of semiconductor technologies. It does not give pass or fail values or recommend specific test equipment, test structures or test algorithms. Wherever possible, it references applicable JEDEC such as JESD47 or other widely accepted standards for requirements documentation. Committee(s): JC-14.2 Free download. Registration or login required.
GUIDELINE FOR CHARACTERIZING SOLDER BUMP ELECTROMIGRATION UNDER CONSTANT CURRENT AND TEMPERATURE STRESS Status: ReaffirmedJune 2011	JEP154	Jan 2008
This document describes a method to test the electromigration (EM) susceptibility of solder bumps, including other types of bumps, such as solder capped copper pillars, used in flip-chip packages. The method is valid for Sn/Pb eutectic, high Pb, and Pb-free solder bumps. The document discusses the advantages and concerns associated with EM testing, as well as options for data analysis. Committee(s): JC-14, JC-14.1 Free download. Registration or login required.
A PROCEDURE FOR EXECUTING SWEAT: Status: Reaffirmed October 2012, September 2018	JEP119A	Aug 2003
This document describes an algorithm for performing the Standard Wafer Level Electromigration Accelerated Test (SWEAT) method with computer controlled instrumentation. The algorithm requires a separate iterative technique (not provided) to calculate the force current for a given target time to failure. This document does not specify what test structure to use with this procedure. However, users of this algorithm report its effectiveness on both straight-lines and via-terminated test structures. Some test-structures design features are provided in JESD87 and in ASTM 1259M - 96. Committee(s): JC-14.2 Free download. Registration or login required.