A three-terminal (collector, emitter, and gate), four-layer (pnpn/npnp) semiconductor device with an MOS-gated channel connecting the two n‑type regions (for n‑channel types), or the two p‑type regions (for p‑channel types), and in which the conductance of the high-resistance collector region is modulated (enhanced) by the injection of minority carriers from an opposite-polarity semiconductor region adjacent to the collector and opposite the channel region.
NOTE 1 The IGBT is a compound semiconductor structure with input characteristics similar to those of a vertical power MOSFET, but containing an additional bipolar component that conductivity-modulates the drain region of the MOSFET section.
NOTE 2 The conductivity modulation of the vertical DMOS power MOSFET drain region substantially reduces the inherent rise in collector-emitter resistance that results with increasing collector-emitter voltage capability.
NOTE 3 The IGBT is similar in basic structure to an MOS-gated thyristor but exhibits a fundamental operational difference in that it maintains gate control, i.e., it does not latch, over a wide range of collector current and collector-emitter voltage.
NOTE 4 The term "insulated-gate bipolar transistor" (IGBT) is the generic name for the entire class of conductivity-enhanced MOS-gated pnpn/npnp devices. Other names used to identify these types of devices include conductivity-modulated field-effect transistor (COMFET), gain-enhanced MOS field-effect transistor (GEMFET), insulated-gate transistor (IGT), and insulated-gate rectifier (IGR).
Insulated-gate bipolar transistor graphic symbols (ref. IEC 617-5):


NOTE In the graphic symbols, the envelope is optional if no element is shown connected to the envelope.